LOCALIZED RESISTANCE ANNEALING PROCESS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20220017982A1
SERIAL NO

17290296

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A localized annealing process and a part having localized areas with increased ductility produced by the process. The part is formed of hard material, tempered, and/or otherwise hardened such that it meets minimum hardness and ductility requirements. The part further includes localized areas that have increased ductility for workability, which could include various types of deformation. The localized annealing process includes providing a part with low levels of ductility and then annealing localized areas of the part for increased ductility that will need to be machined or attached to another formed part. The annealing process includes placing an electrode on either side of the localized area and generating electricity through the localized area. The material in the localized area is then heated from the electricity to form a more ductile physical structure.

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Patent Owner(s)

Patent OwnerAddress
MAGNA INTERNATIONAL INC337 MAGNA DRIVE AURORA L4G 7K1

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
deNIJS, Eric Toronto, CA 10 35
NIU, Xiaoping Richmond Hill, CA 11 6
PENNER, Pavlo Woodbridge, CA 3 1

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