ULTRAVIOLET LIGHT GENERATION TARGET, METHOD FOR MANUFACTURING ULTRAVIOLET LIGHT GENERATION TARGET, AND ELECTRON-BEAM-EXCITED ULTRAVIOLET LIGHT SOURCE

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20220013351A1
SERIAL NO

17296294

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

An ultraviolet light generation target includes a light emitting layer. The light emitting layer contains a YPO4 crystal to which at least scandium (Sc) is added, and receives an electron beam to generate ultraviolet light. Further, a method of manufacturing the ultraviolet light generation target includes a first step of preparing a mixture containing yttrium (Y) oxide, Sc oxide, phosphoric acid, and a liquid, a second step of evaporating the liquid, and a third step of firing the mixture.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
HAMAMATSU PHOTONICS K K1126-1 ICHINO-CHO CHUO-KU HAMAMATSU-SHI SHIZUOKA 4358558 ?4358558

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ICHIKAWA, Norio Hamamatsu-shi, Shizuoka, JP 29 565
IKEDA, Kohei Hamamatsu-shi, Shizuoka, JP 31 77

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation