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United States of America
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Issued Date -
Jan 6, 2022
app pub date -
Nov 15, 2019
filing date -
Nov 15, 2019
priority date (Note) -
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Abstract
In some examples, a method of processing a substrate comprises applying a photoresist (PR) onto a surface of the substrate, pre-exposing the PR to ultra violet (UV) light before depositing or etching a metal oxide (MO) layer onto the PR, and depositing or etching a MO layer onto the PR subsequent to pre-exposing the PR to UV light.
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