VACUUM GENERATION PROCESS FOR DEPOSITION OF BIOMEDICAL IMPLANT MATERIALS
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United States of America
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Dec 30, 2021
app pub date -
Jun 25, 2021
filing date -
Jun 25, 2021
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Abstract
The present disclosure includes a system for processing waste from a chemical vapor deposition process. The system can include an inlet configured to be connected to one or more chemical vapor deposition systems, the inlet configured for receiving an effluent comprising one or more waste gases, a vacuum component in fluid communication with the inlet, the vacuum component configured for maintaining a vacuum of about 0.5 Torr to about 3.5 Torr and actuatable for removing the one or more waste gases from the one or more chemical vapor deposition systems, and a fluid line fluidly connecting the inlet to the vacuum component; and a controller in communication with the vacuum component.
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