CLEANING LIQUID
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United States of America
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Issued Date -
Dec 23, 2021
app pub date -
Sep 3, 2021
filing date -
Sep 3, 2021
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Abstract
An object of the present invention is to provide a cleaning liquid for semiconductor substrates with a change in the pH of the cleaning liquid caused by dilution being suppressed. A cleaning liquid of the invention is a cleaning liquid for semiconductor substrates that contains a chelating agent, and an acidity constant (pKa) of the chelating agent and a pH of the cleaning liquid satisfy a condition defined by Formula (A):
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