METHOD FOR DETERMINING CLEANLINESS OF CLEANING MEMBER, METHOD FOR DETERMINING ADSORPTION CHARACTERISTICS OF CONTAMINANTS THAT CONTAMINATE CLEANING MEMBER, METHOD FOR DETERMINING CLEANLINESS OF SUBSTRATE, PROGRAM FOR DETERMINING CLEANLINESS OF SUBSTRATE, AND PROGRAM FOR DETERMINING END POINT OF CLEANING PROCESS

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United States of America

APP PUB NO 20210384881A1
SERIAL NO

17323700

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Abstract

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In a method for determining cleanliness of a cleaning member that contacts a substrate and with which scrub cleaning is performed, the method includes a first step of self-cleaning a cleaning member by releasing contaminants from the cleaning member into a cleaning liquid, and a second step of bringing a self-cleaning discharged liquid into contact with an electrode of a crystal oscillator, attaching the contaminants contained in the discharged liquid onto the electrode of the crystal oscillator, then measuring a frequency response of the crystal oscillator in which the contaminants are attached onto the electrode, and determining cleanliness of the cleaning member based on the measured frequency response.

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Patent Owner(s)

Patent OwnerAddress
EBARA CORPORATION11-1 HANEDA ASAHI-CHO OTA-KU TOKYO 1448510 ?1448510

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abe, Masahito Tokyo, JP 17 953
Kon, Toshiya Tokyo, JP 1 0
Nakamura, Yumiko Tokyo, JP 28 74
Shima, Shohei Tokyo, JP 13 175
Takatoh, Chikako Tokyo, JP 9 8
Uno, Megumi Tokyo, JP 5 2

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