Plasma Assisted Parylene Deposition
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United States of America Patent
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Nov 4, 2021
app pub date -
Apr 30, 2020
filing date -
Apr 30, 2020
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Abstract
A method for depositing parylene onto a substrate includes utilizing a vaporization chamber and a pyrolysis chamber to crack a dimer into a monomer gas, directly ionizing the monomer gas by passing the monomer gas through a plasma generation chamber comprising plasma prior to injection of the monomer gas into a deposition chamber, and polymerizing the ionized monomer in the deposition chamber to create a polymer and a protective coating on a substrate.
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