GAS LASER APPARATUS, LASER BEAM EMITTING METHOD OF GAS LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD
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United States of America Patent
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Issued Date -
Oct 28, 2021
app pub date -
Jul 9, 2021
filing date -
Feb 20, 2019
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Abstract
A gas laser apparatus includes a chamber; a window provided in the chamber; an optical path tube connected to the chamber; a gas supply port that supplies a purge gas into the optical path tube; an exhaust port that exhausts a gas in the optical path tube; and a control unit, the exhaust port including a main exhaust port provided in the optical path tube, and an auxiliary exhaust port provided in the optical path tube upstream of a flow of the gas in the optical path tube with respect to positions of the window and the main exhaust port, the control unit causing the gas to be exhausted through the main exhaust port before a laser beam is emitted from the chamber and causing the gas to be exhausted through the auxiliary exhaust port in at least a partial period when the laser beam is emitted.
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