Film structure and preparation method thereof

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United States of America Patent

PATENT NO 11662505
APP PUB NO 20210333616A1
SERIAL NO

16608753

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Abstract

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A film structure and a preparation method thereof are provided. The film structure is provided with pore structures; the pore structure includes a gas space and a first protective layer, the first protective layer covers the gas space, and the gas space is filled with a gas. The pore structures with the gas are provided in the film structure, a refractive index of the pore structures is close to a refractive index of air, and a refractive index of the entire film structure is reduced by the influence of the pore structures.

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Patent Owner(s)

Patent OwnerAddress
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO LTDNO 9-2 TANGMING ROAD GONGMING STREET GUANGMING NEW DISTRICT SHENZHEN GUANGDONG 518132

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Liu, Guohe Guangdong, CN 12 47

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