Method and apparatus for repairing defects of a photolithographic mask for the EUV range

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United States of America Patent

PATENT NO 11774848
APP PUB NO 20210325775A1
SERIAL NO

17360532

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Abstract

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The invention relates to a method and an apparatus for repairing at least one defect of a photolithographic mask for the extreme ultraviolet (EUV) wavelength range, wherein the method includes the steps of: (a) determining the at least one defect; and (b) ascertaining a repair shape for the at least one defect; (c) wherein the repair shape is diffraction-based in order to take account of a phase disturbance by the at least one defect.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Capelli, Renzo Heidenheim, DE 17 24
Steigerwald, Hendrik Urmitz, DE 2 7

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