METHOD OF FORMING ION SENSORS
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United States of America Patent
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Oct 21, 2021
app pub date -
Aug 16, 2019
filing date -
Aug 17, 2018
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Abstract
A method for manufacturing a sensor includes etching an insulator layer disposed over a substrate to define an opening exposing a sensor surface of a sensor disposed on the substrate, a native oxide forming on the sensor surface; sputtering the sensor surface with a noble gas to at least partially remove the native oxide from the sensor surface; and annealing the sensor surface in a hydrogen atmosphere.
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