Method of forming leveraged poromeric polishing pad
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United States of America Patent
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Jun 6, 2023
Grant Date -
Oct 21, 2021
app pub date -
Apr 18, 2020
filing date -
Apr 18, 2020
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Abstract
The invention provides a method of forming porous polyurethane polishing pad that includes feeding liquid polyurethane onto a web sheet with a doctor blade while back tensioning the web. Coagulating liquid polyurethane onto the web sheet forms a two-layer substrate. The two-layer substrate has a porous matrix wherein the porous matrix has large pores extending upward from a base surface and open to an upper surface. Spring-arm sections connect lower and upper sections of the large pores.
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