LEVERAGED POROMERIC POLISHING PAD
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United States of America Patent
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Issued Date -
Oct 21, 2021
app pub date -
Apr 18, 2020
filing date -
Apr 18, 2020
priority date (Note) -
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Abstract
The invention provides a porous polyurethane polishing pad that includes a porous matrix. The matrix has large pores that extend upward from a base surface and open to an upper surface. The large pores are interconnected with tertiary pores, a portion of the large pores is open to a top polishing surface and at least a portion of the large pores extend to the top polishing surface. Spring-arm sections connect lower and upper sections of the large pores. The spring-arm sections all are in a same horizontal direction as measured from the vertical orientation and they combine for increasing compressibility of the polishing pad and contact area of the top polishing surface during polishing.
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