Silicon carbide epitaxial substrate and method for manufacturing silicon carbide semiconductor device

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United States of America Patent

PATENT NO 12014924
APP PUB NO 20210320005A1
SERIAL NO

17258967

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Abstract

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When a value obtained by dividing the number of the one or more second regions by a total of the number of the one or more first regions and the number of the one or more second regions is defined as a first defect free area ratio, a value obtained by dividing the number of the one or more fourth regions by a total of the number of the one or more third regions and the number of the one or more fourth regions is defined as a second defect free area ratio, and a value obtained by dividing the number of the one or more macroscopic defects by an area of the central region is defined as X cm−2, A is smaller than B, B is less than or equal to 4, X is more than 0 and less than 4, and a Formula 1 is satisfied.

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Patent Owner(s)

Patent OwnerAddress
SUMITOMO ELECTRIC INDUSTRIES LTD5-33 KITAHAMA 4-CHOME CHUO-KU OSAKA-SHI OSAKA 5410041 ?5410041

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hori, Tsutomu Osaka, JP 54 128
Itoh, Hironori Osaka, JP 19 94
Kanbara, Kenji Osaka, JP 9 22

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