Method and system for producing silicon carbide ingot

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United States of America Patent

PATENT NO 11591711
APP PUB NO 20210317593A1
SERIAL NO

17088104

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Abstract

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A silicon carbide ingot producing method is provided. The method produces a silicon carbide ingot in which an internal space of a reactor is depressurized and heated to create a predetermined difference in temperature between upper and lower portions of the internal space. The method produces a silicon carbide ingot in which a plane of a seed crystal corresponding to the rear surface of the silicon carbide ingot is lost minimally. Additionally, the method produces a silicon carbide ingot with few defects and good crystal quality.

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Patent Owner(s)

Patent OwnerAddress
SENIC INC17-15 4SANDAN 7-RO JIKSAN-EUP SEOBUK-GU CHUNGCHEONGNAM-DO CHEONAN-SI 31040

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Jung Woo Suwon-si, KR 66 197
Jang, Byung Kyu Suwon-si, KR 22 18
Kim, Jung-Gyu Suwon-si, KR 35 40
Ko, Sang Ki Suwon-si, KR 24 39
Ku, Kap-Ryeol Suwon-si, KR 28 20
Park, Jong Hwi Suwon-si, KR 47 37
Yang, Eun Su Suwon-si, KR 11 8

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