Measurement Method, Measurement Device, Measurement System, And Measurement Program

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United States of America Patent

APP PUB NO 20210304597A1
SERIAL NO

17204091

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Abstract

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A measurement method includes: a step of acquiring first observation point information; a step of acquiring second observation point information; a step of calculating a path deflection waveform at a third observation point; a step of calculating a path deflection waveform at a central position between the first observation point and the second observation point; a step of calculating a measurement waveform as a physical quantity at the third observation point; a step of calculating an amplitude coefficient at which a difference is minimized between the measurement waveform and a waveform obtained by multiplying the path deflection waveform at the third observation point by the amplitude coefficient; and a step of calculating, based on the path deflection waveform at the central position and the amplitude coefficient, an estimation waveform as a physical quantity at the central position.

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Patent Owner(s)

Patent OwnerAddress
SEIKO EPSON CORPORATION1-6 SHINJUKU 4-CHOME SHINJUKU-KU TOKYO 160-8801

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KOBAYASHI, Yoshihiro Komagane, JP 153 1041

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