Ablation layer, photosensitive resin structure, method for producing relief printing plate using said photosensitive resin structure
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United States of America Patent
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Nov 15, 2022
Grant Date -
Jul 29, 2021
app pub date -
Sep 15, 2017
filing date -
Sep 23, 2016
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Abstract
An ablation layer for a photosensitive resin for a relief printing plate, the ablation layer containing at least an acid-modified polymer and an infrared-absorbing agent and having a layer acid value as defined below of 2 mg KOH/g or more and 400 mg KOH/g or less, and a neutralized salt ratio as defined below of 0.9 or less, wherein the Layer acid value=(Acid value of the acid-modified polymer)×(Mass ratio of the acid-modified polymer to an entire ablation layer); and wherein the Neutralized salt ratio=(Number of moles of polymer wherein acid in the acid-modified polymer exists in neutralized salt state)/(Total number of moles of the acid-modified polymer).
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