Aftertreatment arrangement and method for the aftertreatment of at least gases downstream of a fluid bed gasification system, and logic unit and use

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United States of America Patent

PATENT NO 11401476
APP PUB NO 20210147755A1
SERIAL NO

16622767

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Abstract

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The invention relates to an aftertreatment arrangement (1.0) for the aftertreatment of at least gases downstream of a fluidized bed gasification process, in particular downstream of an HTW gasifier (1) of a pressure-loaded fluidized bed gasification process, having a particle separation unit (2; 11) which can be arranged downstream of the fluidized bed gasification process and upstream of a gas cooler (3) that can be used for the further aftertreatment of the gases, wherein the aftertreatment arrangement comprises an intermediate cooling unit (12) which can be arranged downstream of the fluidized bed gasification process and upstream of the particle separation unit (11), having a return (B1) for gasification steam (B) that can be coupled to the fluidized bed gasification process. Furthermore, the invention relates to a method for the aftertreatment of at least gases downstream of a fluidized bed gasification process as well as the use of an intermediate cooling unit.

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Patent Owner(s)

Patent OwnerAddress
THYSSENKRUPP INDUSTRIAL SOLUTIONS AG45143 ESSEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abraham, Ralf Bergkamen, DE 17 86
Palmowski, Herbert Duisburg, DE 1 0
Pavone, Domenico Bochum, DE 14 45
Toporov, Dobrin Dortmund, DE 8 22

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