DEVICE AND METHOD FOR THE DEPOSITION OF A MATERIAL LAYER ON A SURFACE AREA OF A WORKPIECE
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United States of America Patent
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Issued Date -
May 20, 2021
app pub date -
Oct 7, 2020
filing date -
Nov 15, 2019
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Abstract
A device for depositing a material layer on a surface of a workpiece has a deposition facility with a hollow shoulder that is rotatable about an axis relative to a base. The shoulder has an indentation that is limited by a circumferential annular face. A passage opening, which is smaller in diameter than the indentation, is formed in the shoulder along the axis. The shoulder is rotated and a deposition material is fed through the passage opening into the indentation where it is plasticized in the indentation. The deposition facility is moved over the surface in such a way that the indentation points towards the surface and a workpiece plane runs tangentially to the surface at the point at which the axis intersects the surface. The annular face is distanced from the surface such that plasticized deposition material is deposited on the surface. A related deposition method is also provided.
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