POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM THEREFROM, AND SOLID STATE IMAGE SENSOR COMPRISING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20210116812A1
SERIAL NO

17041639

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

The present invention provides a positive photosensitive resin composition having high light transmittance, high heat resistance, and excellent pattern processability. The present invention provides a positive photosensitive resin composition containing polysiloxane (A), a naphthoquinonediazide compound (B), and a solvent (C); in which the polysiloxane (A) has at least one structure selected from the following general formulae (1) to (3), and has at least one structure selected from the following general formulae (4) to (6);

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
TORAY INDUSTRIES INC1-1 NIHONBASHI-MUROMACHI 2-CHOME CHUO-KU TOKYO 1038666 ?1038666

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HIBINO, Toshiyasu Otsu-shi, JP 7 7
MATOBA, Yoshinori Otsu-shi, JP 4 25
SUWA, Mitsuhito Otsu-shi, JP 57 497

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation