SURFACE MODIFICATION METHOD OF ALUMINUM NITRIDE CERAMIC SUBSTRATE
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United States of America
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Apr 15, 2021
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Oct 12, 2020
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Oct 12, 2020
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A surface modification method of an aluminum nitride ceramic substrate uses a sputtering deposition and a metal organic chemical vapor deposition (MOCVD) to perform a surface modification of the polycrystalline aluminum nitride ceramic substrate. Accordingly, an aluminum nitride layer is epitaxially grown in two stages of temperature by MOCVD, such that a crystallization phase of monocrystalline aluminum nitride material may be formed on the surface of the polycrystalline aluminum nitride ceramic substrate, so as to decrease a surface roughness of the polycrystalline aluminum nitride ceramic substrate.
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