PHOTOMASK HAVING MULTI-LAYERED TRANSFER PATTERNS
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United States of America Patent
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Issued Date -
Apr 1, 2021
app pub date -
Dec 11, 2020
filing date -
Aug 17, 2017
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Abstract
A photomask includes a light transmission substrate and a phase shift pattern. The phase shift pattern includes a first phase shift pattern layer, a second phase shift pattern layer and a third phase shift pattern layer which are sequentially stacked on a surface of the light transmission substrate. A light transmittance of each of the first and third phase shift pattern layers is less than a light transmittance of the second phase shift pattern layer.
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