Substrate and method for calibration of measurement apparatus

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United States of America Patent

PATENT NO 11549807
APP PUB NO 20210082662A1
SERIAL NO

16812521

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Abstract

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A pattern according to an embodiment includes first and second line patterns, each of the first and second line patterns extends in a direction intersecting a <111> direction and has a side surface, the side surface has at least one {111} crystal plane, the side surface of the first line pattern has a first roughness, and the side surface of the second line pattern has a second roughness larger than the first roughness.

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Patent Owner(s)

Patent OwnerAddress
KIOXIA CORPORATION1-21 SHIBAURA 3-CHOME MINATO-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Iida, Susumu Yoshikawa Saitama, JP 19 246
Tanaka, Satoshi Kawasaki Kanagawa, JP 959 10603
Uchiyama, Takayuki Yokkaichi Mie, JP 74 421

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