System for storing chemical liquid and method for adjusting gas concentration in chemical liquid

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United States of America Patent

PATENT NO 12053745
APP PUB NO 20210077958A1
SERIAL NO

16569489

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Abstract

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Chemical liquid is injected into a tank. A concentration of a first gas dissolved in the chemical liquid is detected. Based on the detected concentration of the first gas, at least one of the first gas and a second gas is injected into the tank to sustain at least one of the concentration of the first gas and a concentration of the second gas in a range of a target value.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTDNO 8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huang, Shang-Yun Hsinchu County, TW 6 1
Kuo, Chun-Yu Hsinchu, TW 11 6
Yu, Shang-Yuan Hsinchu, TW 9 8
Yu, Weibo Hsinchu, TW 9 46

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