RESIST COMPOSITION AND PATTERN FORMATION METHOD USING SAME, COMPOUND AND RESIN
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United States of America Patent
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Mar 4, 2021
app pub date -
Mar 30, 2018
filing date -
Mar 31, 2017
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Abstract
The present invention provides a resist composition comprising one or more tannin compounds selected from the group consisting of a tannin comprising at least one acid dissociation reactive group in the structure and a derivative thereof, and a resin obtained using the tannin or the derivative as a monomer, and a pattern formation method using the same, a compound and a resin.
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