System for Treating A Metal Substrate
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United States of America Patent
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Feb 18, 2021
app pub date -
Feb 8, 2019
filing date -
Feb 9, 2018
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Abstract
Disclosed is a system for treating a substrate surface. The system includes a conditioner composition and a first pretreatment composition. The conditioner composition comprises a hydroxide source and the first pretreatment composition comprises a magnesium element, a halide element, and an oxidizing agent. Methods of treating a substrate surface using the conditioner composition and the first pretreatment composition also are disclosed. Also disclosed are substrates treated with the system and method.
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