APPARATUS AND METHOD FOR TREATING SUBSTRATE
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United States of America Patent
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Jan 14, 2021
app pub date -
Jul 1, 2020
filing date -
Jul 9, 2019
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Abstract
Provided is an apparatus for treating a substrate. The substrate treating apparatus includes a substrate supporting unit for supporting the substrate and fixing the substrate with electrostatic force, a plasma generating unit for generating a discharging plasma for discharging a charge of the substrate, and a power supplying unit for supplying power to the substrate supporting unit and the plasma generating unit, wherein the power supplying unit supplies power of a fluctuating pattern to the plasma generating unit when a charge of the substrate is discharged.
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