METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACE
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United States of America Patent
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Issued Date -
Dec 17, 2020
app pub date -
Jun 26, 2020
filing date -
Jun 4, 2015
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Abstract
Methods and composition sets for forming etch-resist masks on a metallic surface are provided. The method may include depositing a first aqueous composition comprising a first reactive component onto a metallic layer of a substrate; depositing a second aqueous composition comprising a second reactive component on selected portions of the deposited first aqueous composition to form, from a chemical reaction between the first reactive component and the second reactive component, a bi-component material mask in a pattern to protect selected regions of the metallic layer; and depositing an etch solution to remove the metallic layer in regions not protected by the bi-component material mask.
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