POLISHING SOLUTION AND POLISHING METHOD
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United States of America Patent
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Issued Date -
Nov 26, 2020
app pub date -
Aug 8, 2017
filing date -
Aug 8, 2017
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Abstract
Provided is a method for polishing an article including a Co-containing portion to be polished by a polishing liquid, in which the polishing liquid contains water, abrasive particles, and a metal dissolving agent, a pH of the polishing liquid is 6.0 or more, and a content of hydrogen peroxide in the polishing liquid is 0.0001% by mass or less based on the total mass of the polishing liquid.
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