PROCESS FOR MAKING ETCHED PATTERNS
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United States of America Patent
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Issued Date -
Nov 19, 2020
app pub date -
Jan 11, 2019
filing date -
Jan 12, 2018
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Abstract
The present invention relates to a process for making an etched pattern comprising a step of depositing onto a printable metal surface droplets of an ink composition provided by a printing method, wherein the ink composition comprises a first ink vehicle being water, a second ink vehicle being an organic compound and an etchant being an acid or abase according to the Brønsted definition, characterized in that the ink composition has a pH in the range of from (0) to (4) or from (9) to (14). The invention further relates to substrates having a metal surface with an etched pattern, to the use of such substrates in various applications, to articles comprising the inventive substrate and to the use of the inventive process for the production of metal products.
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