EUV PELLICLES

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20200341365A1
SERIAL NO

16758250

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Abstract

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A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ANDE, Chaitanya Krishna Eindhoven, NL 7 2
DE, GRAAF Dennis Waalre, NL 16 42
HOUWELING, Zomer Silvester Utrecht, NL 10 6
KATER, Thijs Eindhoven, NL 4 1
KUIJKEN, Michael Alfred Josephus Son en Breugel, NL 5 5
VALEFI, Mahdiar Eindhoven, NL 5 2

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