FACIAL MASK AND THE METHOD OF FORMING THE SAME
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United States of America Patent
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Issued Date -
Oct 15, 2020
app pub date -
Dec 14, 2019
filing date -
Apr 12, 2019
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Abstract
A substrate for a facial mask is provided, and the substrate is formed by a roll to roll process and to have anti-Virus function. The mask comprises an inner layer, a middle layer and an outer layer, wherein the inner layer or the outer layer comprises a cation metal-organic compound for inhibiting the virus. The cation metal-organic compound comprises a compound of synthesizing acylpyrazolone and Ni+, Cu2+, Co2+ or Zn2+, or a compound of synthesizing tetrathiosemicarbazone, two thiosemicarbazones and Ni+, Cu2+ or Zn2+.
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