Diagonal compound mill
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United States of America Patent
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Oct 26, 2021
Grant Date -
Oct 1, 2020
app pub date -
Mar 29, 2019
filing date -
Mar 29, 2019
priority date (Note) -
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Abstract
Ion beams are directed to a substrate surface to expose a tapered, tilted surface in the substrate. The ion beams and the substrate are situated so that a first ion beam is incident along a first axis at a glancing angle, and a second ion beam is incident along a second axis in a plane defined by the glancing angle and at an angle with respect to the first axis. Exposure to the second ion beam tends to produced superior quality in the exposed surface such as by reducing curtain artifacts.
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