MASK REPAIR APPARATUS AND METHOD FOR REPAIRING MASK
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United States of America Patent
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Issued Date -
Oct 1, 2020
app pub date -
Mar 12, 2020
filing date -
Mar 25, 2019
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Abstract
The present disclosure relates to a mask repair apparatus capable of efficiently repairing a defect of a target EUVL mask. The mask repair apparatus repairs the defect of the target extreme ultra violet lithography (EUVL) mask having a reflective layer, a first layer disposed on the reflective layer, and a second layer disposed on the first layer, and a third layer disposed on the second layer. The mask repair apparatus performs etching of the third layer by a first etching method, and after the etching of the third layer by the first etching method, performs etching of the second layer by the second etching method different from the first etching method.
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