Low Temperature Mechanical Polishing Or Planarization Slurry For Surfactant Solubility
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United States of America Patent
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Issued Date -
Oct 1, 2020
app pub date -
May 14, 2020
filing date -
May 14, 2020
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Abstract
A novel process to make chemical mechanical planarization alkaline barrier slurries has been disclosed. The process provides the ability to solubilize surfactants comprise block co-polymers with low HLB numbers into the alkaline barrier slurries.
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