METHOD FOR PRODUCING MI ELEMENT AND MI ELEMENT
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United States of America Patent
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Issued Date -
Sep 24, 2020
app pub date -
Nov 26, 2018
filing date -
Dec 8, 2017
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Abstract
A method for producing an MI element includes: an insulation step of forming an insulator layer on an outer periphery of an amorphous wire; an electroless plating step of forming an electroless plating layer on an outer peripheral surface of the insulator layer; an electrolytic plating step of forming an electrolytic plating layer on an outer peripheral surface of the electroless plating layer; a resist step of forming a resist layer on an outer peripheral surface of the electrolytic plating layer; an exposure step of exposing the resist layer with a laser to form a spiral groove strip on an outer peripheral surface of the resist layer; an etching step of performing etching using the resist layer as a masking material and removing the electroless plating layer and the electrolytic plating layer in the groove strip to form a coil with the remaining electroless plating layer and electrolytic plating layer.
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