RETICLE AND METHOD OF DETECTING INTACTNESS OF RETICLE STAGE USING THE SAME
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United States of America Patent
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Sep 17, 2020
app pub date -
Mar 14, 2019
filing date -
Mar 14, 2019
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Abstract
In some embodiments, a reticle structure is provided. The reticle structure includes a reticle stage and a reticle mounted on the reticle stage. The reticle stage includes plural first burls and plural second burls, in which the second burls are disposed on a center of the reticle stage and the first burls disposed on an edge of the reticle stage such that the first burls surround the second burls. The reticle includes a base material and a pattern layer overlying the base material. The base material is secured on the first and second burls of the reticle stage. The pattern layer includes plural first gratings, and each of the first burls is vertically aligned with one of the first gratings.
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