Liquid low temperature oxide

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United States of America Patent

PATENT NO 11499234
APP PUB NO 20200291530A1
SERIAL NO

16815114

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Abstract

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In some embodiments, a method of forming a structure includes: forming a liquid oxide material at a low temperature by dissolving fumed nanoparticles in a liquid hydrate of a silicate or an aluminate; applying the liquid oxide material on a substrate; and at a low temperature, curing the liquid oxide material to evolve gaseous water, leaving structural silicate glass.

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Patent Owner(s)

Patent OwnerAddress
MASSACHUSETTS INSTITUTE OF TECHNOLOGY77 MASSACHUSETTS AVENUE CAMBRIDGE MA 02139

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Duncan, Bradley P Andover, US 4 13
Smith, Melissa A Cambridge, US 16 50

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