Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same
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United States of America Patent
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Aug 23, 2022
Grant Date -
Aug 13, 2020
app pub date -
Apr 30, 2020
filing date -
Sep 27, 2016
priority date (Note) -
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Abstract
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. In one embodiment, a gas flow control system for achieving improved transient response in apparatuses for controlling gas flow is disclosed. Specifically, by providing a command to an apparatus to deliver a predetermined mass flow rate at a future turn on time, the apparatus is able to pre-pressurize a P1 volume so that the response time of the apparatus is no longer dependent on the speed of the apparatus's control valves and the limitations of the control loop.
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