Sputtering target-backing plate assembly

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United States of America Patent

PATENT NO 11538673
APP PUB NO 20200258724A1
SERIAL NO

16774735

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Abstract

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A sputtering target-backing plate assembly obtained by bonding a sputtering target and a backing plate using a brazing material, wherein a braze bonding layer which bonds the sputtering target and the backing plate contains a material having thermal conductivity that is higher than that of the brazing material in an amount of 5 vol % or more and 50 vol % or less, and a thickness of the braze bonding layer is 100 μm or more and 700 μm or less. An object is to prevent the seepage of the brazing material while maintaining the thickness of the braze bonding layer.

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Patent Owner(s)

Patent OwnerAddress
JX NIPPON MINING & METALS CORPORATIONTOKYO 105-8417

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Endo, Yosuke Ibaraki, JP 24 406
Ise, Naoki Ibaraki, JP 1 0
Sakashita, Ryosuke Ibaraki, JP 6 3
Takamura, Hiroshi Ibaraki, JP 21 83

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