Rotating Disk Reactor with Self-Locking Carrier-to-Support Interface for Chemical Vapor Deposition
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United States of America Patent
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Issued Date -
Aug 6, 2020
app pub date -
Jan 26, 2020
filing date -
Feb 5, 2019
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Abstract
A substrate carrier that supports a semiconductor substrate in a chemical vapor deposition system that includes a support having a beveled inner top surface including a top surface and a bottom surface. The top surface has a recessed area for receiving at least one substrate for chemical vapor deposition processing. The bottom surface has a beveled edge that forms a conical interface with the beveled inner top surface of the support at a self-locking angle that prevents substrate carrier movement in a vertical direction at a predetermined temperature equal to a maximum operation temperature. A coefficient of thermal expansion of a material forming the substrate carrier is substantially the same as a coefficient of thermal expansion of a material forming the support.
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