Cleaning liquid, cleaning method, and method for producing semiconductor wafer

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United States of America Patent

PATENT NO 11149231
APP PUB NO 20200231900A1
SERIAL NO

16835402

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Abstract

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A cleaning liquid containing at least one surfactant (A) selected from the group consisting of a polyoxyalkylene alkyl ether phosphoric acid, a polyoxyalkylene alkyl ether acetic acid and a polyoxyalkylene alkyl ether sulfonic acid and a chelating agent (C), which has a pH of 8 or more, and a cleaning liquid containing an oxidizing agent (B) and a chelating agent (C), which has a pH of 8 or more.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI CHEMICAL CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Harada, Ken Tokyo, JP 44 215
Shibata, Toshiaki Tokyo, JP 39 335
Takeshita, Kan Tokyo, JP 4 4
Takeshita, Yutaro Tokyo, JP 3 10

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