Charged Particle Beam Lithography System
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United States of America Patent
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Jul 16, 2020
app pub date -
Jan 15, 2020
filing date -
Jan 15, 2019
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Abstract
A collimated electron beam is illuminated to a grounded metal mask such that patterns on the mask can be transferred to a substrate identically. In a preferred embodiment, a linear electron source can be provided for enhancing lithographic throughput. The metal mask is adjacent to the substrate, but does not contact with substrate.
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