COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORESIST, AND PROCESS OF PREPARING THE SAME

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United States of America Patent

APP PUB NO 20200209743A1
SERIAL NO

16236952

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Abstract

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A photoresist composition, including a polymer having a C6-30 hydroxyaromatic group, a solvent, and a sulfonium salt having Formula (I):

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Patent Owner(s)

Patent OwnerAddress
ROHM & HAAS ELECT MAT455 FOREST STREET MARLBOROUGH MA MASSACHUSETTS 01752 MARLBOROUGH MA MASSACHUSETTS 01752 01752

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aqad, Emad Northborough, US 70 229
Kwok, Amy M Shrewsbury, US 9 63
Li, Mingqi Shrewsbury, US 105 434
Marangoni, Tomas Marlborough, US 12 4
Park, Jong Keun Westborough, US 65 724

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