SYSTEMS AND METHODS FOR STORAGE AND SUPPLY OF F3NO-FREE FNO GASES AND F3NO-FREE FNO GAS MIXTURES FOR SEMICONDUCTOR PROCESSES

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United States of America Patent

APP PUB NO 20200203127A1
SERIAL NO

16227623

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Abstract

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Disclosed are systems and methods for supplying a F3NO-free FNO-containing gas and systems and methods for etching using the F3NO-free FNO-containing gas. The system comprises a NiP coated steel cylinder with a polished inner surface to store the F3NO-free FNO-containing gas, a cylinder valve to release the F3NO-free FNO-containing gas from the cylinder, a manifold assembly, including a pressure regulator and line components to deliver the F3NO-free FNO-containing gas to a target reactor. The pressure regulator de-pressurizes the F3NO-free FNO-containing gas in the manifold assembly thereby dividing the manifold assembly into a first pressure zone upstream of the pressure regulator and a second pressure zone downstream of the pressure regulator. A gaseous composition comprises F3NO-free FNO gas containing less than approximately 1% F3NO impurity by volume and an inert gas being capable of suppressing the concentration of F3NO impurity in the F3NO-free FNO gas.

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Patent Owner(s)

Patent OwnerAddress
L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDEPARIS FRANCE PARIS PARIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsu, Chih-yu Tsukuba, JP 50 210
NISHIYAMA, Ayaka Tsukuba, JP 2 3
Shen, Peng Tsukuba, JP 43 200
Stafford, Nathan Damascus, US 40 432
Yokota, Jiro Tsukuba, JP 8 415

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