Film formation apparatus and film formation method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 12, 2021
Grant Date -
Jun 11, 2020
app pub date -
Dec 6, 2019
filing date -
Dec 11, 2018
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A film formation apparatus is configured to supply mist of a solution to a surface of a substrate so as to grow a film on the surface of the substrate, and the film formation apparatus may include: a furnace configured to house the substrate so as to heat the substrate; and a mist supply apparatus configured to supply the mist of the solution to the furnace, in which the film formation apparatus includes a portion configured to be exposed to the mist, and at least a part of the portion of the film formation apparatus is constituted of a material comprising boron nitride.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully