SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, MACHINE LEARNING DEVICE, AND PREDICTION DEVICE
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United States of America Patent
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Issued Date -
Apr 16, 2020
app pub date -
Oct 8, 2019
filing date -
Oct 10, 2018
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate cleaning method which can determine an appropriate replacement time of a cleaning tool is disclosed. The substrate cleaning method includes: rubbing a cleaning tool against a substrate in the presence of a cleaning liquid while supplying the cleaning liquid onto the substrate to thereby clean a surface of the substrate; acquiring surface data representing surface properties of the cleaning tool in a wet condition by use of an atomic force microscope after performing cleaning of the surfaces of a predetermined number of substrates; and comparing the surface data with a predetermined threshold to thereby determine a replacement time of the cleaning tool.
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