MASK AND METHOD FOR MANUFACTURING THE SAME AND METHOD FOR PATTERNING A LAYER

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United States of America

APP PUB NO 20200073224A1
SERIAL NO

16455257

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Abstract

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A mask for reflecting an electromagnetic radiation includes a substrate, a reflective multi-layered stack over a surface of the substrate, a metal capping layer over the reflective multi-layered stack, a metal silicide buffer layer over the metal capping layer, and an optical absorber pattern over the metal silicide buffer layer.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHEN, CHUN-LANG TAINAN COUNTY, TW 55 312
CHEN, JHENG-YUAN HSINCHU, TW 5 5
TU, CHIH-CHIANG TAOYUAN, TW 85 480
YANG, SHIH-HAO TAINAN CITY, TW 14 20

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