BLANKMASK AND PHOTOMASK, AND METHODS OF FABRICATING THE SAME
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United States of America
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Jan 16, 2020
app pub date -
Dec 7, 2018
filing date -
Dec 7, 2018
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Abstract
A blankmask according to the present disclosure includes a light-shielding film provided on a transparent substrate; and a hard mask film provided on the light-shielding film and comprising molybdenum chromium (MoCr). Thus, the hard mask film has not only an enhanced etching speed but also sufficient etching resistance to fluorine (F)-based dry etching, so that an etching load against a resist film can be decreased and a hard mask film pattern and a light-shielding film pattern can be improved in a line edge roughness (LER), thereby forming a photomask for high-precision pattern printing.
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