OPTIMIZATION OF A LITHOGRAPHY APPARATUS OR PATTERNING PROCESS BASED ON SELECTED ABERRATION
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
N/A
Issued Date -
N/A
app pub date -
Aug 30, 2017
filing date -
Aug 30, 2017
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A method including obtaining a selected component of optical aberration of or for a lithography apparatus, under a processing condition; computing an approximate of a cost function, based on the selected component; and producing an adjustment of the lithography apparatus or a patterning process that uses the lithography apparatus, based on the approximate of the cost function.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully